| سال | هفته | ID | Title | ApplNo | IPC | Applicant | Subgroup | زیر گروه | رشته | شرح | Description |
|---|
2025 | 47 | WO/2025/185935 | METHOD FOR SPATIALLY LIMITING MATERIAL REMOVAL, OPTICAL ELEMENT AND SEMICONDUCTOR TECHNOLOGY SYSTEM | EP2025/053500 | G03F 1/38 | CARL ZEISS SMT GMBH | PHYSICS | فیزیک | ابزارها | 2025 | 47 | WO/2025/236810 | OPTICAL FLOW-BASED OVERLAY ERROR MEASUREMENT METHOD, APPARATUS, AND SYSTEM, AND STORAGE MEDIUM | CN2025/080226 | G03F 7/20 | MZ OPTOELECTRONIC TECHNOLOGY (SHANGHAI) CO., LTD. | PHYSICS | فیزیک | ابزارها | 2025 | 47 | WO/2025/236941 | SUBSTRATE PROCESSING APPARATUS AND METHOD | CN2025/088234 | G03F 7/20 | ACM RESEARCH (SHANGHAI) , INC. | PHYSICS | فیزیک | ابزارها | 2025 | 47 | WO/2025/236942 | SUBSTRATE PROCESSING DEVICE, AND METHOD | CN2025/088240 | G03F 7/00 | ACM RESEARCH (SHANGHAI) , INC. | PHYSICS | فیزیک | ابزارها | 2025 | 47 | WO/2025/237612 | ACTUATOR | EP2025/060359 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2025 | 47 | WO/2025/237622 | UNIFORMITY CORRECTION MODULE AND CORRESPONDING METHOD OF VARYING LOCAL ANGULAR DISTRIBUTION OF RADIATION USING A UNIFORMITY CORRECTION MODULE | EP2025/060587 | G03F 7/20 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2025 | 47 | WO/2025/237627 | OBJECT SUPPORT, OBJECT TABLE AND MASK TABLE | EP2025/060737 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2025 | 47 | WO/2025/237631 | SYSTEMS AND METHODS FOR EVALUATING DATA FOR TRAINING MACHINE-LEARNING MODELS | EP2025/060952 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2025 | 47 | WO/2025/237633 | SYSTEMS AND METHODS FOR OVERLAY MEASUREMENT | EP2025/060954 | G03F 7/20 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2025 | 47 | WO/2025/237649 | SYSTEM AND METHOD FOR COMBINED FIELD AND PUPIL INTENSITY-BASED PHASE RETRIEVAL | EP2025/061266 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2025 | 47 | WO/2025/237794 | ARRANGEMENT COMPRISING A MICROLITHOGRAPHIC PROJECTION SYSTEM AND A WALL ELEMENT FOR THERMAL SHIELDING, AND PROJECTION EXPOSURE SYSTEM | EP2025/062566 | G03F 7/00 | CARL ZEISS SMT GMBH | PHYSICS | فیزیک | ابزارها | 2025 | 47 | WO/2025/239051 | RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMATION METHOD | JP2025/013656 | G03F 7/004 | JSR CORPORATION | PHYSICS | فیزیک | ابزارها | 2025 | 47 | WO/2025/239075 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | JP2025/014315 | G03F 7/004 | TOKYO OHKA KOGYO CO., LTD. | PHYSICS | فیزیک | ابزارها | 2025 | 47 | WO/2025/239179 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING REFLECTIVE MASK | JP2025/015983 | G03F 1/24 | AGC INC. | PHYSICS | فیزیک | ابزارها | 2025 | 47 | WO/2025/239181 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING REFLECTIVE MASK | JP2025/015985 | G03F 1/24 | AGC INC. | PHYSICS | فیزیک | ابزارها | 2025 | 47 | WO/2025/239227 | RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JP2025/016537 | G03F 7/004 | JSR CORPORATION | PHYSICS | فیزیک | ابزارها | 2025 | 47 | WO/2025/239333 | RESIST MATERIAL, RESIST MATERIAL FOR DRY ETCHING, PATTERN FORMING METHOD, AND STRUCTURE | JP2025/017276 | G03F 7/004 | TOKYO OHKA KOGYO CO., LTD. | PHYSICS | فیزیک | ابزارها | 2025 | 47 | WO/2025/239388 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND ELECTRONIC COMPONENT | JP2025/017547 | G03F 7/004 | AGC INC. | PHYSICS | فیزیک | ابزارها | 2025 | 47 | WO/2025/239411 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | JP2025/017638 | G03F 7/11 | NISSAN CHEMICAL CORPORATION | PHYSICS | فیزیک | ابزارها | 2025 | 47 | WO/2025/240155 | METROLOGY TO REDUCE OVERLAY ERROR | US2025/027854 | G03F 9/00 | ONTO INNOVATION INC. | PHYSICS | فیزیک | ابزارها | 2025 | 47 | WO/2025/240288 | MAINTAINING RAW FLEXIBLE PLATE INTEGRITY USING PRE-HARDENED FLEXIBLE PLATE REGIONS | US2025/028825 | G03F 7/20 | DUPONT ELECTRONICS, INC. | PHYSICS | فیزیک | ابزارها |